Project information
Synthesis of new Si-O(N)-C materials by plasmachemical methods
- Project Identification
- 1K05025
- Project Period
- 1/2005 - 12/2007
- Investor / Pogramme / Project type
-
Ministry of Education, Youth and Sports of the CR
- Programme of Support for Junior R&D Workers (National Research Programme)
- MU Faculty or unit
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Faculty of Science
- prof. RNDr. Jan Janča, DrSc.
- doc. Mgr. Lenka Zajíčková, Ph.D.
- Keywords
- plasmachemical deposition, PECVD, organosilicons, plasma polymers, hard coatings, plasma treatment
Objectives of the project are the preparation of new Si-O-C:H polymers variable in their nanostructure and organic-inorganic character and the preparation of hard protective Si-O-C and Si-N-C coatings exhibiting low internal stress and good adhesion to various substrates. These materials will be prepared in continuos wave and pulsed radio frequency glow discharges using organosilicon reactants. The film properties will be optimized for expected applications by changing deposition parameters, especially composition of reactive mixture, degree of ion bombardment, on-time and off-time. Processes during the deposition will be studied by several plasma diagnostics methods in order to understand a correlation between these processes and final film properties. In the same time the procedure of plasma treatment leading to good film adhesion will be determined. The results will be published at international conferences and published in refereed journals.
Publications
Total number of publications: 15
2008
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Composition and functional properties of organosilicon plasma polymers from hexamethyldisiloxane and octamethylcyclotetrasiloxane
ORGANIC/INORGANIC HYBRID MATERIALS - 2007, year: 2008
2007
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Comparative Study of Films Deposited from HMDSO/O2 in Continuous Wave and Pulsed rf Discharges
Plasma processes and polymers, year: 2007, volume: 4, edition: S1
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Deposition and Characterization of Nanostructured Silicon-Oxide Containing Diamond-Like Carbon Coatings
Optoelectronics and Advanced Materials - Rapid Communications, year: 2007, volume: 1, edition: 10
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Deposition of protective coatings in rf organosilicon discharges
Plasma Sources Science and Technology, year: 2007, volume: 16, edition: 1
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Models of dielectric response in disordered solids
Optics Express, year: 2007, volume: 15, edition: 24
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Organosilicon thin films deposited by plasma enhanced CVD: Thermal changes of chemical structure and mechanical properties
Journal of Physics and Chemistry of Solids, year: 2007, volume: 68, edition: 1
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Plasma enhanced CVD of thin films using hexamethyldisiloxane and octamethyltetrasiloxane monomers
18th International Symposium on Plasma Chemistry, year: 2007
2006
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Deposition of protective couatings in RF organosilicon discharges
In Abstracts of Invited Lectures and Contributed Papers, 18th Europhysics Conference on Atomic and Molecular Physics of Ionized Gases, year: 2006
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Modeling of DLC Optical Properties Based on Parameterization of Density of States
Application of Nanocrystalline Diamond and Diamond Like Carbon Materials, year: 2006
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Modeling of optical constants of organosilicon thin films by parameterization of denstity of states
4th Workshop Ellipsometry, year: 2006