Publication details
In situ analysis of PMPSi by spectroscopic ellipsometry and XPS
| Authors | |
|---|---|
| Year of publication | 2004 |
| Type | Article in Periodical |
| Magazine / Source | Surface and Interface Analysis |
| MU Faculty or unit | |
| Citation | |
| Field | Solid matter physics and magnetism |
| Keywords | spectroscopic ellipsometry; x-ray photoelectron spectroscopy; XPS; polysilanes; PMPSi |
| Description | In-situ monitoring of the UV-light and thermal treatment of PMPSi thin films by real-time spectroscopic ellipsometry and XPS is reported. The films were treated both under ultrahigh vacuum and oxygen atmosphere. The results of this study indicate that the Si-Si bonds in the polymer main chain were primarily broken at the UV-light treatment. However, the Si radicals recombined into the polymer-like chains causing no remarkable chemical shift. The UV-light treatment under enhanced sample temperature (~80C) in oxygen atmosphere resulted in the more intense degradation of the PMPSi film. This can be related to cutting off the volatile methyl groups from the polymer main chains. |