Publication details
Actinometry for understanding PECVD of thin films from O2/HMDSO plasmas
| Authors | |
|---|---|
| Year of publication | 2005 |
| Type | Article in Proceedings |
| Conference | Proceedings of the XXVII ICPIG |
| MU Faculty or unit | |
| Citation | |
| Web | http://www.icpig2005.nl/cd/D:/Proceedings_ICPIG_2005.html |
| Field | Plasma physics |
| Keywords | actinometry; HMDSO; optical emission spectroscopy |
| Description | We applied actinometry for the calculation of dissociation degree in oxygen CCP discharges used for the deposition from O2/HMDSO plasmas. Dissociation degree exhibited a slight increase with increasing r.f. power and maximum of 20% for 5 Pa of oxygen. This relatively high value was not enough for deposition of SiO2-like films because the HMDSO percentage in the feed was too high at this low oxygen partial pressure. Rapid decrease of dissociation degree to 2-4% for higher oxygen flow rates, i.e. higher pressures resulted in still insufficient oxidation of film precursors. |
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