Publication details
Towards limits of x-ray specular reflectivity
| Authors | |
|---|---|
| Year of publication | 2009 |
| Type | Article in Periodical |
| Magazine / Source | Materials Structure in Chemistry, Biology, Physics and Technology |
| MU Faculty or unit | |
| Citation | |
| Field | Solid matter physics and magnetism |
| Keywords | x-ray reflectivity; fourier transform; photoresist |
| Description | Using the high resolution diffractometer we have successfully measured photoresist layers more than 1 um thick by x-rays. The thicknesses obtained by x-ray reflectivity correspond well to the ones obtained by optical reflection. |
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