Publication details

Interdiffusion in Ge rich SiGe/Ge multilayers studied by in situ diffraction

Authors

MEDUŇA Mojmír CAHA Ondřej KEPLINGER Mario STANGL Julian BAUER Günther MUSSLER Gregor GRÜTZMACHER Detlev

Year of publication 2009
Type Article in Periodical
Magazine / Source Physica stat.sol.(a)
MU Faculty or unit

Faculty of Science

Citation
Field Solid matter physics and magnetism
Keywords interdiffusion; x-ray diffraction; multilayers
Description We have investigated SiGe/Si multilayers with Ge content 70% and 90% annealed in-situ at temperatures in the range 600-700 C by x-ray diffraction.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.

More info