Project information
Study of hybrid deposition process and its application for thin film deposition
- Project Identification
- GP202/08/P038
- Project Period
- 1/2008 - 12/2010
- Investor / Pogramme / Project type
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Czech Science Foundation
- Postdoctoral projects
- MU Faculty or unit
- Faculty of Science
- Keywords
- magnetron sputtering, hybrid PVD-PECVD, hysteresis behaviour, thin film deposition, nanocomposite, BCN
This project focuses on investigation of behaviour of hybrid PVD-PECVD process, which will be used for preparation of nanocomposite n-Ti:C/a-C:H and a-BCN:H materials. In this hybrid deposition process, a gaseous hydrocarbon will be used as a source of carbon instead of its conventional sputtering from magnetron target. Hysteresis behaviour of this process together with properties of deposited thin films will be investigated and compared with those of PVD process. Comparative study for two types of hydrocarbons will be performed. Advanced model of reactive sputtering assuming nonuniform discharge current density will be developed. This model will be extended to accommodate the interaction of gaseous hydrocarbon with all surfaces in the deposition chamber.
Publications
Total number of publications: 37
2008
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Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process
19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts, year: 2008
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Influence of N2 and CH4 on deposition rate of boron based thin films prepared by magnetron sputtering
Book of Extended Abstracts of 2nd Central European Symposium on Plasma Chemistry, year: 2008
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Influence of N2 and CH4 on depositon rate of boron based thin films prepared by magnetron sputtering
Chemické listy, year: 2008, volume: 102, edition: 1
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Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process
Programme and Abstract Book of the 23rd Symposium on Plasma Physics and Technology, year: 2008
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Modeling of Radial Variation of Target Poisoning During Reactive Sputtering Deposition Process
19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts, year: 2008
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Modeling of reactive sputtering process with non-linear discharge current density
Book of Extended Abstracts of 2nd Central European Symposium on Plasma Chemistry, year: 2008
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Role of Neutral Gas Temperature on Hysteresis Behaviour of Reactive Sputtering Deposition Process
Programme and Abstract Book of 23rd Symposium on Plasma Physics and Technology, Prague, Czech Republic, 16.-19.June 2008, year: 2008