prof. Mgr. Petr Vašina, Ph.D.
ředitel ústavu – Ústav fyziky a technologií plazmatu
kancelář: pav. 06/01025
Kotlářská 267/2
611 37 Brno
telefon: | 549 49 6479 |
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sociální a akademické sítě: |
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Počet publikací: 381
2005
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Modeling of high power pulsed microwave discharge
Abstracts and full paper CD of 17th International Symphosium on Plasma Chemistry, rok: 2005
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Preionised pulsed magnetron discharges for ionised physical vapour deposition
Journal of Optoelectronics and Advanced Materials, rok: 2005, ročník: 7, vydání: 5
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Reduction of transient regime in fast preionized high power pulsed magnetron discharge
Europhysics Letters, rok: 2005, ročník: 72, vydání: 3
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Role of Oxygen Admixture on Nitrogen Afterglow
Book of Contributed Papers of 15th Symphosium on Applications on Plasma Processes and 3rd EU-Japan Joint Symphosium on Plasma Processing, rok: 2005
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Spatial characterization of an IPVD reactor: neutral gas temperature and interpretation of optical spectroscopy measurements
Plasma Sources Science and Technology, rok: 2005, ročník: 14, vydání: 2
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Spectroscopic analysis of a pulsed magnetron discharge
Journal of Optoelectronics and Advanced Materials, rok: 2005, ročník: 7, vydání: 5
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Study of High Power Pulsed Microwave Discharge Afterglow
Book of Contributed Papers of 15th Symphosium on Applications on Plasma Processes and 3rd EU-Japan Joint Symphosium on Plasma Processing, rok: 2005
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Theoretical study of pulsed microwave discharge in nitrogen
Plasma Sources Sci. Technol., rok: 2005, ročník: 14, vydání: 4
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Time resolved measurements of the N2-O2 afterglow
Abstracts of Frontiers in Low Temperature Plasma Diagnostics VI, rok: 2005
2004
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Comparison of the ionization efficiency of two ionized physical vapour deposition processes: magnetron discharge assisted by microwave plasma or radio-frequency plasma
Prosseding of Ninth International Conference on Plasma Surface Engineering, rok: 2004