Informace o publikaci
Influence of Discharge Parameters on Composition of Films Deposited by PECVD from Hexamethyldisiloxane/Oxygen Mixtures
| Autoři | |
|---|---|
| Rok publikování | 2000 |
| Druh | Článek ve sborníku |
| Konference | Abstracts of Invited Lectures and Contributed Papers, XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases |
| Fakulta / Pracoviště MU | |
| Citace | |
| Obor | Fyzika plazmatu a výboje v plynech |
| Klíčová slova | Thin Films; PECVD; Hexamethyldisiloxane; RF discharge; RBS; ERD; FTIR; Polycarbonate |
| Popis | The composition of films, deposited from hexamethyldisiloxane/oxygen mixtures was studied by FTIR transmittance measurements, Rutherford backscattering method (RBS) and elastic recoil detection (ERD). Films were characterized by the ellipsometry, the morphology of the film surfaces was studied by SEM and the mechanical properties of films were characterized by Vickers indentation technique. |
| Související projekty: |