Informace o publikaci
The plasma diagnostics of the RF torch discharge plasma chemical system
| Autoři | |
|---|---|
| Rok publikování | 2000 |
| Druh | Článek ve sborníku |
| Konference | International Symposium, on High Pressure Low Temperature Plasma Chemistry- HAKONE VII, Greifswald-Germany 2000, Contributed Papers |
| Fakulta / Pracoviště MU | |
| Citace | |
| Obor | Fyzika plazmatu a výboje v plynech |
| Klíčová slova | Torch discharge plasma; surface treatmnet; plasma diagnostics |
| Popis | The possibility to use of special configuration of the torch discharge burning in mixture of argon and n-hexan for deposition of CH thin films on Al and Cu substrate is reported. Basic parameters of the diacharge is studied using emission spectroscopy. |
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