Informace o publikaci
Structural characterization of a lamellar W/Si multilayer grating
| Název česky | Strukturní charakterizace planárních W/Si vrstevnatých mřížek |
|---|---|
| Autoři | |
| Rok publikování | 1999 |
| Druh | Článek v odborném periodiku |
| Časopis / Zdroj | J. Appl. Phys. |
| Fakulta / Pracoviště MU | |
| Citace | |
| www | http://www.sci.muni.cz/~mikulik/Publications.html#JergelMikulikRapid |
| Obor | Fyzika pevných látek a magnetismus |
| Klíčová slova | x-ray reflectivity; gratings; multilayers |
| Popis | A lamellar multilayer grating of the nominal normal and lateral periods 8 nm and 800 nm, respectively, was obtained by etching a planar amorphous W/Si multilayer up to the substrate. The specular reflectivity, grating truncation rods of non-zero orders, and a reciprocal space map of the scattered intensity close to the total external reflection were measured using the CuKa radiation. For the first time, we demonstrate an extraction of real structural parameters of a fully etched periodic multilayer grating from fitting the measured truncation rods based on the matrix modal eigenvalue approach to the dynamical theory of reflectivity by gratings. |
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