Informace o publikaci
Plasma diagnostics of multi-pulse HiPIMS discharge
| Autoři | |
|---|---|
| Rok publikování | 2022 |
| Druh | Konferenční abstrakty |
| Fakulta / Pracoviště MU | |
| Citace | |
| Popis | A complex understanding of the physical processes driving the HiPIMS discharge is essential for optimizing thin-film growth and developing more efficient sputtering processes. Ten years ago, it was proposed to split a standard single HiPIMS pulse into several micro-pulses, forming so-called chopped or multi-pulse HiPIMS (m-HiPIMS) [1]. This was done to enhance total ion flux to the substrate while keeping the deposition rate high. In the pulse sequence, many thermalized sputtered atoms are present in the volume after the first pulse, and these atoms can be ionized easier during the subsequent pulses. |