doc. Mgr. Lenka Zajíčková, Ph.D.
docentka – Ústav fyziky kondenzovaných látek
korespondenční adresa:
Kotlářská 267/2, 611 37 Brno
kancelář: E112
Kolejní 2906/4
612 00 Brno
| telefon: | 541 149 223 |
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| e‑mail: |
| sociální a akademické sítě: |
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Počet publikací: 346
2000
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Treatise on Heating of Objects Immersed in Plasma
WDS 2000, Proceedings of Contributed Papers, Part II: Physics of Plasmas and Ionized Media, rok: 2000
1999
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DC AC and HF Plasma Pencil - New Possibilities for Plasma Surface and Liquid Treatment at Atmospheric Pressure
Progress in Plasma Processing of Materials, rok: 1999
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Deposition of CNx Films in Inductively Coupled RF Discharge
Proceedings of ICPIG XXIV, rok: 1999
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Diagnostics and Applications of High Frequency Plasma Pencil
Proceedings of 14th International Symposium on Plasma Chemistry, rok: 1999
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Diagnostics and Effects of Discharge Generated by Plasma Pencil Device
Proceedings of 12th Symposium on Application of Plasma Processes, rok: 1999
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HF plasma pencil- new source for plasma surface processing
Surface and coating technology, rok: 1999, ročník: 1999, vydání: 116-119
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Characterisation of DLC Films Prepared by PECVD
Proceedings of 12th Symposium on Application of Plasma Processes, rok: 1999
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Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds
Thin Solid Films, rok: 1999, ročník: 338, vydání: 1
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Characterization of Composite Carbon Nitride Films Prepared by the Inductively Coupled RF Plasma
Proceedings of 14th International Symposium on Plasma Chemistry, rok: 1999
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On the Hollow Electrode HF Plasma Pencil
Proceedings of ICPIG XIV, rok: 1999